Process Control


Reduced Resist Consumption

  • Solvent Pre-Wet Addition to Coater
  • Programmed stream solvent dispense at wafer center
  • Available with any resist pump (no RRC pump/controller required)
  • Mark V, Vz, 7/8 versions


Syringe Dispense

  • 55cc N2 pressurized syringe dispense
  • Pressure/time control
  • Controlled as one of 4 maximum coater dispenses


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